Photoresists are one of the essential ingredients for chip manufacturing and micro/nano engineering. We will show how we’re using them in a DIY Electron Beam Lithography set-up and how you’re able to cook your own cheap resists and mix your own developers. Resists? What's that? What are their applications How does it work (types (positive/negative), chemistry, proximity effect, dosage etc) EBL? What's that? How does it work Pros & cons: comparison between EBL (slow) photolithography (fast) Which resist can I use for EBL DIY cooking of PMMA based resists Comparison of different solvents Composition of different developers Comparison of different developers Applications Usage as a mask Usage as a structural dielectric material ...(?) The EBL exposure process simple SEM retrofitted with an EBL controller The common file formats (GDSII & OASIS) Scan-Gen: how to generate the proper curves for the exposure Hardware: off-the-shelf embedded modules like the RedPitaya Generation of different filling curve styles, calibration, compensation of the proximity effect, correction of the SEMs intrinsic parameters, dosage! Fiducial detection and alignment for multi-pass/multi-layer processes Stuff comes together walk through the complete process along a simple example More Examples Thanks & Credits Q & A