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Fabrication of low-cost and large-area complex nanostructures: The fabrication process step by step

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Fabrication of low-cost and large-area complex nanostructures: The fabrication process step by step
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Many nanooptical applications require suitable nanofabrication technology. Hole-mask colloidal nanolithography has proven to be a low-cost and large-area alternative for the fabrication of complex plasmonic nanostructures as well as metamaterials. In this video, we show you the fabrication process step by step in the lab.
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Transcript: English(auto-generated)
Hello, my name is Jun Zhao. I'm a PhD student in Forest Physics Institute, University of Stuttgart. I'm working on the low-cost fabrication of large area plasmonic nanostructures.
Today, I will show you the whole fabrication process step by step. Now, let's go to the lab. For our experiment, at the beginning, we should prepare all our samples. So in this experiment, we use silicon and glass substrate.
For both of them, we should clean them at first with acetone in ultrasonic base for about five minutes.
We just put them again in copanel also for about five minutes. After the cleaning process, we should clean our samples with nitrogen gas.
Until now, that's all for the silicon substrate. But for glass substrate, it's a little more complicated. It means after the cleaning, we should put the glass substrate in this silane-to-low solution for about eight hours.
Usually, we leave them just overnight. This process is to make sure that the polymer layer, which we will sprinkle later on the glass substrate, will stay fast on it. With the clean substrate, we can do the spin coat process now. For spin coat, we use this PMMA
resist, and then we should press all the air
out of the needle. After that, we can put the sample on the spin coat and turn on the vacuum. For spin coat, we can use different parameters. For example, the
RPM, namely round per minute. And for this process, we use 4,000 RPM and for about 40 seconds. And then we drop coat the PMMA solution on substrate.
After 40 seconds, we put the sample out of the spin coat. And then we should clean the backside a little with acetone because there is still some rest PMMA on it. And then we will bake the sample with hot plate.
We're using the temperature 165 centigrade and for about
120 seconds. After spin coat process, we should drop coat our polystyrene spheres now. But before this, there is another very important thing to do, namely the oxygen plasma atom. This process will reduce the hydrophobicity of the surface of our PMMA layer,
which is very important for the drop coating process later. We can set the time
0.3 minutes. It means 18 seconds. And the power, we can set it here at about 5. So it means 50 percent. And now we can turn on the gas
and tune the pressure of oxygen to about 1.33 millibar. Now it's finished. So we just turn off the gas and turn off the pump. Now we can get our sample out of this machine.
80 seconds oxygen plasma treatment. We should directly go on the drop coating process. For this process, we need to prepare the polystyrene spheres at first and also
the PDDA solution, which will bring a positive charge on our PMMA layer at first. Now we drop one or two droplets of PDDA solution in
0.2 percent concentration on our PMMA layer. Then we wash it
with distilled water. And then we should drop coat the polystyrene spheres in 0.1 percent
onto the PMMA layer. First, this polystyrene sphere solution should be in ultrasonic baths for about 15 minutes before this treatment. The droplet of the polystyrene sphere
solution should cover the whole surface of the sample.
And we should wait about one minute. After one minute, we should wash the sample again.
Put it into a warm water with the temperature of the hotplate about 100 centigrade. And then we should wait for about three minutes. Now we have put our sample inside of IGAN.
With IGAN, we will operate at first five nanometer gormium as intensive layer and then 20 nanometer guard. And now we have just wait for the vacuum.
The whole evaporation process will be controlled with program. After this evaporation, we will put out our samples and then do the lift-off process in order to remove all the polystyrene spheres. And then we should check the mask with holes with our
scanning electron microscope. After the gold layer evaporation, we will do the lift-off process. In this process, we will remove all the polystyrene spheres from our samples.
We put the samples into the water and then put the glass into the ultrasonic bath. The parameter for the lift-off is 100 watt and 20 minutes.
After the lift-off of polystyrene spheres, we should check our mask if all the polystyrene spheres are gone. It's very important for the plasma action later. Now we put our sample in
scanning electron microscope. From the SAM picture, we can see nearly all the polystyrene spheres are gone. Just in a few places, they're still there. So for the masks after lift-off process,
we should check it with SAM and for different places to make sure that all the polystyrene spheres are really gone. Now after the lift-off of polystyrene spheres, we have to do the oxygen plasma agent process again.
But this time we have to create extend holes inside of our PMMA layer. So it means we need more time and more power. Here for this thickness of the PMMA layer, we should use F.6
minutes. And the power should be also changed from 50% to 100%. Here you can see the t-toothing and rotation evaporation machine.
With this machine, we can fabricate different and complex large-area plasmonic nanostructures. Here we use two stepping motors. With the program SMC view, we can control both of them. With one of the stepping motors, we can control the rotation of the samples.
With the continual rotation, we can fabricate a ring structure. But with limited rotation, we can get a spittering structure. After the evaporation of the structures, we will remove the gold mask just with scotch tape. Furthermore, lift-off process will be cleaning with acetone or even with
oxygen plasma for some sensitive measurement. After the lift-off of the mask and the cleaning of our samples, we can see the structures with SAM again.
With FTLR spectroscopy, we can measure the reflection of the fabricated spittering structures. Here we use three different polarizations. We define zero-degree polarization along the gaps of the spittering. With zero-degree polarization,
we can see the first and the third order mode of the spitterings. And with 90-degree polarization, we can see the second order mode of the spittering, as shown here with the red curve. This was the whole fabrication process of our experiment.
For further more information or more theories, you can just watch the second video of ours or just visit our website to read more papers. Thank you. Bye-bye.