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An innovative tool for fabrication of computer generated holograms

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Titel An innovative tool for fabrication of computer generated holograms
Serientitel The 9th International Symposium on Display Holography (ISDH 2012)
Teil 26
Anzahl der Teile 47
Autor Smith, Henry
Lizenz CC-Namensnennung - keine Bearbeitung 2.0 UK: England & Wales:
Sie dürfen das Werk in unveränderter Form zu jedem legalen Zweck nutzen, vervielfältigen, verbreiten und öffentlich zugänglich machen, sofern Sie den Namen des Autors/Rechteinhabers in der von ihm festgelegten Weise nennen.
DOI 10.5446/21028
Herausgeber River Valley TV
Erscheinungsjahr 2012
Sprache Englisch

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Dauer 18:18

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Fachgebiet Informatik
Abstract Based on research at MIT, LumArray, Inc. has developed a maskless photolithography tool, the ZP-150, designed to cover an entire 6-inch substrate with a continuous, coherent high-resolution pattern, thereby avoiding the “stitching problem” and making it ideal for fabricating computer-generated holograms (CGH). No mask is required, as data is transferred directly from a computer to a spatial-light modulator that adjusts the intensity of 1000 beamlets, and directs them to 1000 diffractive-optical lenses. Patterns of arbitrary geometry, with placement precision ~1nm, are written by scanning the stage in coordination with modulation of the beamlets by the spatial-light modulator. The throughput of one 6-inch wafers per hour far exceeds that of electron-beam lithography. A fully automated proximity-effect-correction algorithm enables fine and large features to be written with equal ease, as well as the creation of 3-D structures. The ZP-150 uses stable, non-chemically amplified photoresists. Extension of resolution from the current 150 nm to the sub-100 nm domain is planned. In addition to providing rapid turn around on designs, we envisage the ZP-150 being used in customized manufacturing of CGH’s by virtue of its modest cost and low maintenance.

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