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An innovative tool for fabrication of computer generated holograms

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Title An innovative tool for fabrication of computer generated holograms
Title of Series The 9th International Symposium on Display Holography (ISDH 2012)
Part Number 26
Number of Parts 47
Author Smith, Henry
License CC Attribution - NoDerivatives 2.0 UK: England & Wales:
You are free to use, copy, distribute and transmit the work or content in unchanged form for any legal purpose as long as the work is attributed to the author in the manner specified by the author or licensor.
DOI 10.5446/21028
Publisher River Valley TV
Release Date 2012
Language English

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Subject Area Computer Science
Abstract Based on research at MIT, LumArray, Inc. has developed a maskless photolithography tool, the ZP-150, designed to cover an entire 6-inch substrate with a continuous, coherent high-resolution pattern, thereby avoiding the “stitching problem” and making it ideal for fabricating computer-generated holograms (CGH). No mask is required, as data is transferred directly from a computer to a spatial-light modulator that adjusts the intensity of 1000 beamlets, and directs them to 1000 diffractive-optical lenses. Patterns of arbitrary geometry, with placement precision ~1nm, are written by scanning the stage in coordination with modulation of the beamlets by the spatial-light modulator. The throughput of one 6-inch wafers per hour far exceeds that of electron-beam lithography. A fully automated proximity-effect-correction algorithm enables fine and large features to be written with equal ease, as well as the creation of 3-D structures. The ZP-150 uses stable, non-chemically amplified photoresists. Extension of resolution from the current 150 nm to the sub-100 nm domain is planned. In addition to providing rapid turn around on designs, we envisage the ZP-150 being used in customized manufacturing of CGH’s by virtue of its modest cost and low maintenance.
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