We're sorry but this page doesn't work properly without JavaScript enabled. Please enable it to continue.
Feedback

Engineering of materials for CMOS microelectronics

Formale Metadaten

Titel
Engineering of materials for CMOS microelectronics
Serientitel
Anzahl der Teile
23
Autor
Lizenz
CC-Namensnennung 3.0 Deutschland:
Sie dürfen das Werk bzw. den Inhalt zu jedem legalen Zweck nutzen, verändern und in unveränderter oder veränderter Form vervielfältigen, verbreiten und öffentlich zugänglich machen, sofern Sie den Namen des Autors/Rechteinhabers in der von ihm festgelegten Weise nennen.
Identifikatoren
Herausgeber
Erscheinungsjahr
Sprache

Inhaltliche Metadaten

Fachgebiet
Genre
Abstract
Recently, the goals of obtaining a light source fully integrated on Silicon has boosted the exploitation of alternative semiconductor materials (strained Ge, GeSn), whose properties and performance appear superior to those of Silicon itself, towards their application in photonics, sensing, THz technology and quantum computing. For this, the experimental analysis such as Raman Spectroscopy , Photoluminesce and XRay Spectroscopy needs to be coupled to a proper simulation platform, in order not only to give the correct interpretation of experimental data, but also to provide prediction and optimization of material process and device design. Here we provide a systematic study on how the temperature-dependent distribution of strain can impact the optical and transport performance of semiconductor devices. We investigate strained Ge microdisks, instrumental to develop a guideline for integrated light emitters, and also metal electrodes for quantum confinement in CMOS compatible devices.